RF sputtered polytetrafluoroethylene - A potential masking material for MEMS fabrication process

Journal of Micromechanics and Microengineering

Volumn 15, Issue 5, 2005, Pages 1102-1113

  Bodas, Dhananjay S ^a   Gangal, S A ^b  

^a FEMTO ST INSTITUTE   (France)

^b UNIVERSITY OF PUNE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT ANGLE; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTELLIGENT MATERIALS; MASKS; MICROELECTROMECHANICAL DEVICES; NATURAL FREQUENCIES; POLYMERS; SCANNING ELECTRON MICROSCOPY; SILICON; SPUTTERING; X RAY PHOTOELECTRON SPECTROSCOPY;

ETCHANTS; MASKING MATERIALS; MICROSYSTEMS TECHNOLOGY; POLYMER FILMS;

POLYTETRAFLUOROETHYLENES;

EID: 24344448658     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/5/029     Document Type: Article

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