Selective area deposition of a-C:H films as masks for anisotropic etching of crystalline silicon in aqueous potassium hydroxide

Vacuum

Volumn 49, Issue 1, 1998, Pages 49-50

  Fissore, Alfeu ^a   Alves, Marco A R ^a   Da Silva Braga, Edmundo ^a   Cescato, Lucila ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL RESISTANCE; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; ETCHING; MASKS; POTASSIUM COMPOUNDS; SILICON; THIN FILMS;

POTASSIUM HYDROXIDE; SELECTIVE AREA DEPOSITION;

AMORPHOUS FILMS;

EID: 0031641679     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(97)00131-0     Document Type: Article

References (8)

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8. 8._Angus, J.C., Koidl, P. and Domitz, S., in Plasma Deposited Thin Films, ed. J. Mort and F. Jansen. (Chemical Rubber, Boca Raton, FL), 1986.