-
1
-
-
0027611975
-
Monolithic microbridges in silicon using laser machining and anisotropic etching
-
Alavi M., Fabula Th., Schumacher A., Wagner H.-J. Monolithic microbridges in silicon using laser machining and anisotropic etching. Sens. Actuators, A. 37-38:1993;661-665.
-
(1993)
Sens. Actuators, a
, vol.3738
, pp. 661-665
-
-
Alavi, M.1
Fabula, Th.2
Schumacher, A.3
Wagner, H.-J.4
-
2
-
-
0030260406
-
Maskless etching of three-dimensional silicon structures in KOH
-
Li X., Bao M., Shen S. Maskless etching of three-dimensional silicon structures in KOH. Sens. Actuators, A. 57:1996;47-52.
-
(1996)
Sens. Actuators, a
, vol.57
, pp. 47-52
-
-
Li, X.1
Bao, M.2
Shen, S.3
-
3
-
-
0031175604
-
A study of two-step silicon anisotropic etching for a polygon-shaped microstructure using KOH solution
-
B. Kang, M.R. Haskard, & N.D. Samaan.
-
Kang B., Haskard M.R., Samaan N.D. A study of two-step silicon anisotropic etching for a polygon-shaped microstructure using KOH solution. Sens. Actuators, A. Vol. 62:1997;646-651.
-
(1997)
Sens. Actuators, a
, vol.62
, pp. 646-651
-
-
-
4
-
-
0031146711
-
Micromachining of (hkl) silicon structures: Experiments and 3D simulation of etched shapes
-
Tellier C.R., Durand S. Micromachining of (hkl) silicon structures: experiments and 3D simulation of etched shapes. Sens. Actuators, A. 60:1997;168-175.
-
(1997)
Sens. Actuators, a
, vol.60
, pp. 168-175
-
-
Tellier, C.R.1
Durand, S.2
-
5
-
-
0016496026
-
Correlation of the anisotropic etching of single-crystal silicon spheres and wafers
-
Weirauch D.F. Correlation of the anisotropic etching of single-crystal silicon spheres and wafers. J. Appl. Phys. 46(4):1975;1478-1483.
-
(1975)
J. Appl. Phys.
, vol.46
, Issue.4
, pp. 1478-1483
-
-
Weirauch, D.F.1
-
6
-
-
0027577581
-
Surface free energy model of silicon anisotropic etching
-
Hesketh P.J., Ju Ch., Gowda S. Surface free energy model of silicon anisotropic etching. J. Electrochem. Soc. 140(4):1993;1080-1095.
-
(1993)
J. Electrochem. Soc.
, vol.140
, Issue.4
, pp. 1080-1095
-
-
Hesketh, P.J.1
Ju, Ch.2
Gowda, S.3
-
7
-
-
0031700033
-
Characterization of orientation-dependent etching properties of single-crystal silicon: Effect of KOH concentration
-
Sato K., Shikida M., Matsushima Y., Yamashiro T., Asaumi K., Iriye Y., Yamamoto M. Characterization of orientation-dependent etching properties of single-crystal silicon: effect of KOH concentration. Sens. Actuators, A. 64:1998;87-93.
-
(1998)
Sens. Actuators, a
, vol.64
, pp. 87-93
-
-
Sato, K.1
Shikida, M.2
Matsushima, Y.3
Yamashiro, T.4
Asaumi, K.5
Iriye, Y.6
Yamamoto, M.7
-
8
-
-
0028499061
-
Anisotropic etching of silicon in rubidium hydroxide
-
Wang T., Surve S., Hesketh P. Anisotropic etching of silicon in rubidium hydroxide. J. Electrochem. Soc. 141(9):1994;2494-2497.
-
(1994)
J. Electrochem. Soc.
, vol.141
, Issue.9
, pp. 2494-2497
-
-
Wang, T.1
Surve, S.2
Hesketh, P.3
-
9
-
-
0026880537
-
Measurements of the anisotropic etching of a single-crystal silicon sphere in aqueous caesium hydroxide
-
Ju Ch., Hesketh P.J. Measurements of the anisotropic etching of a single-crystal silicon sphere in aqueous caesium hydroxide. Sens. Actuators, A. 33:1992;191-196.
-
(1992)
Sens. Actuators, a
, vol.33
, pp. 191-196
-
-
Ju, Ch.1
Hesketh, P.J.2
-
10
-
-
0025521074
-
Anisotropic etching of crystalline silicon in alkaline solution
-
Seidel H., Csepregi L., Heuberger A., Baumgärtel H. Anisotropic etching of crystalline silicon in alkaline solution. J. Electrochem. Soc. 137(11):1990;3612-3626.
-
(1990)
J. Electrochem. Soc.
, vol.137
, Issue.11
, pp. 3612-3626
-
-
Seidel, H.1
Csepregi, L.2
Heuberger, A.3
Baumgärtel, H.4
-
11
-
-
0031170457
-
Synthesis of SiC microstructures in Si technology by high dose carbon implantation: Etch-stop properties
-
Serre C., Perez-Rodriguez A., Romano-Rodriquez A., Calvo-Barrio L., Morante J.R., Esteve J., Acero M.C., Skorupka W., Kögler R. Synthesis of SiC microstructures in Si technology by high dose carbon implantation: etch-stop properties. J. Electrochem. Soc. 144(6):1997;2211-2215.
-
(1997)
J. Electrochem. Soc.
, vol.144
, Issue.6
, pp. 2211-2215
-
-
Serre, C.1
Perez-Rodriguez, A.2
Romano-Rodriquez, A.3
Calvo-Barrio, L.4
Morante, J.R.5
Esteve, J.6
Acero, M.C.7
Skorupka, W.8
Kögler, R.9
-
12
-
-
0032187740
-
Silicon anisotropic etching in alkaline solutions I
-
Barycka I., Zubel I. Silicon anisotropic etching in alkaline solutions I. Sens. Actuators, A. 70:1998;250-259.
-
(1998)
Sens. Actuators, a
, vol.70
, pp. 250-259
-
-
Barycka, I.1
Zubel, I.2
-
13
-
-
0032186826
-
Silicon anisotropic etching in alkaline solutions II
-
Zubel I. Silicon anisotropic etching in alkaline solutions II. Sens. Actuators, A. 70:1998;260-268.
-
(1998)
Sens. Actuators, a
, vol.70
, pp. 260-268
-
-
Zubel, I.1
|