RF Sputter Deposition of Poly(tetrafluoroethylene) Films as Masking Materials for Silicon Micromachining

Journal of Applied Polymer Science

Volumn 91, Issue 2, 2004, Pages 1183-1192

  Bodas, Dhananjay S ^a   Patil, Sheetal J ^a   Mandale, A B ^b   Gangal, S A ^a  

^a UNIVERSITY OF PUNE   (India)

^b NATIONAL CHEMICAL LABORATORY   (India)

Author keywords

FT IR; Structure; X ray

Indexed keywords

ADHESION; BINDING ENERGY; CHEMICAL BONDS; CROSSLINKING; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MASKS; MICROMACHINING; PASSIVATION; POLYTETRAFLUOROETHYLENES; SILICON; SPUTTER DEPOSITION; SURFACE TENSION; X RAY PHOTOELECTRON SPECTROSCOPY;

CONTACT ANGLES; MASKING MATERIALS;

PLASTIC FILMS;

FILM; POLYTETRAFLUOROETHYLENE;

EID: 0346735340     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/app.13191     Document Type: Article

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