SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 392, Issue 2, 2001, Pages 208-213

Rf magnetron sputtering of polytetrafluoroethylene under various conditions

(7) Biederman, H a Zeuner, M b Zalman, J a Bilkova P a Slavinska D a Stelmasuk, V a Boldyreva, A a

a CHARLES UNIVERSITY (Czech Republic)

b IOT GmbH (Germany)

Author keywords

Fluorocarbons; Plasma polymers; rf Magnetron sputtering; Wettability

Indexed keywords

ARGON; CARBON NITRIDE; FLUOROCARBONS; MAGNETRON SPUTTERING; MASS SPECTROMETRY; MELTING; NITROGEN; PLASMAS; POLYTETRAFLUOROETHYLENES; SPUTTER DEPOSITION; TARGETS; WETTING; X RAY PHOTOELECTRON SPECTROSCOPY;

ENERGY RESOLVED MASS SPECTROMETRY;

PLASTIC FILMS;

EID: 0035974483 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01029-X Document Type: Conference Paper

Times cited : (72)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.