Adhesion between PMMA mask layer and silicon wafer in KOH aqueous solution

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3512, Issue , 1998, Pages 422-430

  Ilie, Mihaela ^a   Marculescu, Bogdan ^a   Moldovan, Nicolae ^a   Nastase, Nicoleta ^a   Olteanu, Mihaela ^a  

^a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ETCHING; INTERFACIAL ENERGY; MASKS; MICROMACHINING; OPTIMIZATION; POLYMETHYL METHACRYLATES; POTASSIUM COMPOUNDS; SILICON WAFERS; SUBSTRATES; SURFACE TENSION;

SUPERFICIAL TENSIONS;

MICROELECTROMECHANICAL DEVICES;

EID: 0032296262     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.324086     Document Type: Conference Paper

References (3)