PTFE as a masking material for MEMS fabrication

Journal of Micromechanics and Microengineering

Volumn 15, Issue 4, 2005, Pages 802-806

  Bodas, Dhananjay S ^a   Gangal, S A ^a  

^a UNIVERSITY OF PUNE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ETCHING; FABRICATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROELECTROMECHANICAL DEVICES; POLYMETHYL METHACRYLATES; PRESSURE MEASUREMENT; SILICON; SPUTTERING; SURFACE TENSION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ANISOTROPIC ETCHING; MASKING MATERIALS; STRESS LAYERS; TEMPERATURE RESISTANCE;

POLYTETRAFLUOROETHYLENES;

EID: 17444407058     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/4/018     Document Type: Article

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