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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 11 B, 2002, Pages 6912-6915

Synthesis of high dielectric constant titanium oxide thin films by metalorganic decomposition

(4) Fukuda, Hisashi a Maeda, Shinichi a Salam, K M A a Nomura, Shigeru a

a MURORAN INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

Dielectrics; Insulating thin films; Metal oxide semiconductor structures; Metalorganic decomposition; Titanium oxide films

Indexed keywords

ANNEALING; CAPACITANCE; CAPACITORS; DIELECTRIC MATERIALS; PERMITTIVITY; SYNTHESIS (CHEMICAL); TITANIUM DIOXIDE;

INSULATING THIN FILMS; METALORGANIC DECOMPOSITION;

THIN FILMS;

EID: 24244446821 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.41.6912 Document Type: Article

Times cited : (13)

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