Effect of transverse current injection during air annealing on the formation of oxides in thin Ti films

Journal of Applied Physics

Volumn 85, Issue 1, 1999, Pages 498-500

  Parkansky, N ^a   Alterkop, B ^a   Goldsmith, S ^a   Boxman, R L ^a   Rosenberg, Yu ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007487160     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369478     Document Type: Article

References (14)

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