Open air plasma chemical vapor deposition of highly dielectric amorphous TiO2 films

Applied Physics Letters

Volumn 68, Issue 21, 1996, Pages 2965-2967

  Ha, Hyun Kwon ^a   Yoshimoto, Mamoru ^a   Koinuma, Hideomi ^a   Moon, Bum Ki ^a   Ishiwara, Hiroshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000003834     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116370     Document Type: Article

References (14)

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