Temperature dependent defect formation and charging in hafnium oxides and silicates

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 1, 2005, Pages 201-205

  Lim, D ^a   Haight, R ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FEMTOSECOND PULSES; HAFNIUM OXIDES;

ANNEALING; LASER PULSES; PHOTOELECTRON SPECTROSCOPY; PHOTOEMISSION; SILICATES; TEMPERATURE DISTRIBUTION; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY;

HAFNIUM COMPOUNDS;

EID: 24144434278     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1850105     Document Type: Article

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