Spectroscopic ellipsometry of TaNx and VN films

Thin Solid Films

Volumn 455-456, Issue , 2004, Pages 473-477

  Mistrik, J ^a   Takahashi, K ^a   Antos, R ^a   Aoyama, M ^a   Yamaguchi, T ^a   Anma, Y ^a   Fukuda, Y ^a   Takeyama, M B ^b   Noya, A ^b   Jiang, Z T ^c   Thurgate, S M ^c   Riessen, G V ^c  

^a SHIZUOKA UNIVERSITY   (Japan)

^b KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

^c MURDOCH UNIVERSITY   (Australia)

Author keywords

Ellipsometry; Nitrides; Optical properties; Sputtering

Indexed keywords

ELLIPSOMETRY; NITRIDES; OPTICAL PROPERTIES; PERMITTIVITY; SILICA; SPECTROSCOPIC ANALYSIS; SPUTTERING; SUBSTRATES; THIN FILMS; VANADIUM COMPOUNDS;

DIELECTRIC FUNCTION; SPECTROSCOPIC ELLIPSOMETRY; TANTALUM NITRIDE;

TANTALUM COMPOUNDS;

EID: 11144356761     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.245     Document Type: Conference Paper

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