Characterization and production metrology of gate dielectric films

Materials Science in Semiconductor Processing

Volumn 4, Issue 1-3, 2001, Pages 3-8

  Diebold, Alain C ^a   Canterbury, Jesse ^a   Chism, Will ^a   Richter, Curt ^b   Nguyen, Nhan ^b   Ehrstein, Jim ^b   Weintraub, Chad ^c  

^a SEMATECH   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC FILMS; DISPERSIONS; SEMICONDUCTOR DEVICE MANUFACTURE; TANTALUM COMPOUNDS; ZIRCONIA;

PRODUCTION METROLOGY;

GATES (TRANSISTOR);

EID: 0035247255     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(00)00153-0     Document Type: Article

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