Etching of zirconium oxide, hafnium oxide, and hafnium silicates in dilute hydrofluoric acid solutions

Journal of Materials Research

Volumn 19, Issue 4, 2004, Pages 1149-1156

  Lowalekar, Viral ^a   Raghavan, Srini ^a  

^a University of Arizona   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; HAFNIUM COMPOUNDS; HEAT TREATMENT; HYDROFLUORIC ACID; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PERMITTIVITY; SILICA; THICKNESS MEASUREMENT; ZIRCONIA;

HAFNIUM OXIDE; HAFNIUM SILICATES;

DIELECTRIC MATERIALS;

EID: 2342537710     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2004.0149     Document Type: Article

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