Etching mechanism of vitreous silicon dioxide in HF-based solutions

Journal of the American Chemical Society

Volumn 122, Issue 18, 2000, Pages 4345-4351

  Knotter, D Martin ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

GLASS; HYDROFLUORIC ACID; SILICON DIOXIDE;

ACID BASE BALANCE; AQUEOUS SOLUTION; ARTICLE; CHEMICAL BOND; DISSOLUTION; PH; PKA; PROTON TRANSPORT; REACTION ANALYSIS;

EID: 0034630965     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja993803z     Document Type: Article

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