Physcial characterization of ultrathin high k dielectrics

Materials Research Society Symposium - Proceedings

Volumn 745, Issue , 2002, Pages 23-33

  Vandervorst, W ^b   Brijs, B ^a   Bender, H ^a   Conard, O T ^a   Petry, J ^a   Richard, O ^a   Van Elshocht, S ^a   Delabie, A ^a   Caymax, M ^a   De Gendt, S ^a  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

METALLORGANIC CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIELECTRIC LAYERS;

DIELECTRIC MATERIALS;

EID: 0037955884     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-745-n2.2     Document Type: Conference Paper

References (6)

1. Bogdan Govoreanu et al., 2002 Intern. Conf. on Solid State Devices and Materials.
2. S.Van Elshoft et al.: Proc. MRS 2002 Fall Meeting-2002, Boston, USA
3. H.Bender et al.: proc ALTECH-2003
4. M. L. Green,et al. J.App. Phys 92,(2002) 7168-7174
5. H.Bender et al.: Proceedings of IWGI, Tokyo, Japan, November 2001
6. T.Conard et al. Proc. of the SIMS-XIII, Japan, to be publ. in Applied Surface Science