Oriented AlN films prepared with solid AlCl3 source by bias assisted Cat-CVD

Materials Science and Engineering: B

Volumn 107, Issue 2, 2004, Pages 161-165

  Huang, A P ^a   Wang, G J ^a,b   Xu, S L ^a   Zhu, M K ^a   Li, G H ^a   Wang, B ^a   Yan, H ^a  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

^b LIAOCHENG UNIVERSITY   (China)

Author keywords

AlN; Cat CVD; Orientation; Substrate bias

Indexed keywords

ATOMIC FORCE MICROSCOPY; CATALYSIS; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; DEPOSITION; DIAMOND FILMS; ENERGY GAP; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IONIZATION; METALLIC FILMS; NUCLEATION; SYNTHESIS (CHEMICAL); THERMAL CONDUCTIVITY; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

CRYSTAL DISTORTION; HYDROGEN TREATMENT;

ALUMINUM NITRIDE;

EID: 1242264815     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2003.10.085     Document Type: Article

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