Preparation and characterization of electrochemically deposited carbon nitride films on silicon substrate

Journal of Physics D: Applied Physics

Volumn 37, Issue 6, 2004, Pages 907-913

  Yan, Xingbin ^a   Xu, Tao ^a   Chen, Gang ^a   Yang, Shengrong ^a   Liu, Huiwen ^a   Xue, Qunji ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

FRICTION COEFFICIENTS; LIQUID PHASES;

ATOMIC FORCE MICROSCOPY; ELECTRIC FIELDS; ELECTRODEPOSITION; ELECTROLYSIS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FRICTION; MICROSTRUCTURE; MORPHOLOGY; RAMAN SPECTROSCOPY; SILICON; THICK FILMS; WEAR RESISTANCE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE;

EID: 1842477036     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/6/015     Document Type: Article

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