Amorphous hydrogenated carbon nitride films deposited via an expanding thermal plasma at high growth rates

Thin Solid Films

Volumn 333, Issue 1-2, 1998, Pages 29-34

  De Graaf, A ^a   Dinescu, G ^b   Longueville, J L ^a,d   Van De Sanden, M C M ^a   Schram, D C ^a   Dekempeneer, E H A ^c   Van Ijzendoorn, L J ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b NATIONAL INSTITUTE FOR LASER   (Romania)

^c FLEMISH INSTITUTE FOR TECHNOLOGICAL RESEARCH VITO   (Belgium)

^d UNIVERSITY OF NAMUR   (Belgium)

Author keywords

Amorphous materials; Nitrides; Plasma processing and deposition; Tribology

Indexed keywords

CARBON INORGANIC COMPOUNDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROHARDNESS; NITRIDES; PLASMA SPRAYING; TRIBOLOGY;

THERMAL PLASMAS;

AMORPHOUS FILMS;

EID: 0032205725     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00762-7     Document Type: Article

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