Structure and characteristics of thin films prepared by rf plasma-enhanced chemical vapor deposition

Physical Review B - Condensed Matter and Materials Physics

Volumn 56, Issue 8, 1997, Pages 4949-4954

  Dawei, Wu ^a   Dejun, Fu ^a   Huaixi, Guo ^a   Zhihong, Zhang ^a   Xianquan, Meng ^a   Xiangjun, Fan ^a  

^a WUHAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001289452     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.56.4949     Document Type: Article

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