Optical and electronic properties of plasma-deposited hydrogenated amorphous carbon nitride and carbon oxide films

Thin Solid Films

Volumn 482, Issue 1-2, 2005, Pages 24-33

  Godet, C ^a   Adamopoulos, G ^a   Kumar, Sushil ^a   Katsuno, T ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

Carbon oxide films; Plasma deposited hydrogenated amorphous carbon nitride; Raman studies

Indexed keywords

CHEMICAL BONDS; DEPOSITION; ELECTRODES; ELECTRONIC PROPERTIES; OPTICAL PROPERTIES; RAMAN SCATTERING; THIN FILMS;

CARBON MATRIX; CARBON OXIDE FILMS; PLASMA-DEPOSITED HYDROGENATED AMORPHOUS CARBON NITRIDE; RAMAN STUDIES;

CARBON;

EID: 17744367058     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.112     Document Type: Conference Paper

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