Electron cyclotron resonance deposition, structure, and properties of oxygen incorporated hydrogenated diamondlike amorphous carbon films

Journal of Applied Physics

Volumn 96, Issue 10, 2004, Pages 5456-5461

  Adamopoulos, G ^a,d   Godet, C ^a   Zorba, T ^b   Paraskevopoulos, K M ^b   Ballutaud, D ^c  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

^c Centre National de la Recherche Scientifique   (France)

^d UNIVERSITÉ DE STRASBOURG   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMISORPTION; COMPRESSIVE STRESS; ELECTRON CYCLOTRON RESONANCE; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGENATION; OXYGEN; RAMAN SPECTROSCOPY; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

BIOCHEMICAL COATINGS; NUCLEAR REACTION ANALYSIS (NRA); OPTICAL BAND GAP; PLASMA DEPOSITION;

DIAMOND LIKE CARBON FILMS;

EID: 10044241894     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1804624     Document Type: Article

References (47)

1. J. Robertson, Prog. Solid State Chem. 21, 199 (1991).
2. J. Robertson, Surf. Coat. Technol. 50, 185 (1992).
3. J. Robertson, Mater. Sci. Eng., R. 37, 129 (2002).
4. D. R. McKenzie, Rep. Prog. Phys. 59, 1611 (1996).
5. A. Grill, Diamond Relat. Mater. 8, 428 (1999).
6. M. Hwang and C. Lee, Mater. Sci. Eng., B 75, 24 (2000).
7. C. Godet, N. M. J. Conway, J. E. Bourée, K. Bouamra, A. Grosman, and C. Ortega, J. Appl. Phys. 91, 4154 (2002).
8. N. Nakamura, T. Itani, H. Chiba, K. Watanabe, and K. Kuhikara, Mater. Res. Soc. Symp. Proc. 593, 415 (2000).
9. F. Thiery, C. Vallée, Y. Pauleau, F. Gaboriau, A. Lacoste, Y. Arnal, and J. Pelletier, Surf. Coat. Technol. 151, 165 (2002).
10. G. Adamopoulos, C. Godet, B. Drevillon, Y. Saito, D. N. Batchelder, A. Grosman, and C. Ortega, Diamond Relat. Mater. 12, 983 (2003).
11. R. L. C. Wu, W. C. Lanter, J. D. Webqnek, P. B. Kosel, K. Miyoshi, and C. A. DeJoseph, 5th International Conference on the Applications of Diamond and Related Materials, p. 237.
12. R. R. Burke, J. Pelletier, C. Pomot, and L. Vallier, J. Vac. Sci. Technol. A 8, 2931 (1990).
13. P. Bulkin, N. Bertrand, and B. Drevillon, Thin Solid Films 296, 66 (1997).
14. P. Bulkin, A. Hofrichter, T. Heitz, J. Hue, B. Drevillon, and J. J. Benattar, J. Vac. Sci. Technol. A 20, 338 (2002).
15. J. Taue, R. Grigorovici, and A. Vancu, Phys. Status Solidi 15, 627 (1966).
16. G. E. Jellison and F. A. Modine, Appl. Phys. Lett. 69, 371 (1996).
17. G. Amsel, J. P. Nadai, E. D'Artemare, D. David, E. Girard, and J. Moulin, Nucl. Instrum. Methods 92, 481 (1971).
18. V. Quillet, F. Abel, and M. Schott, Nucl. Instrum. Methods Phys. Res. B 83, 47 (1993).
19. E. Grassman, G. D. Lempert, J. Kulik, D. Marion, J. W. Rabalais, and Y. Lifshitz, Appl. Phys. Lett. 68, 1214 (1996).
20. M. St. C. Flett, Characteristic Frequencies of Chemical Groups in the Infrared (Elsevier, Amsterdam, 1963).
21. G. Socrates, Infrared Characteristic Croup Frequencies (Wiley, New York, 1980).
22. J. W. Robinson, Practical Handbook of Spectroscopy (CRC, Boston,1991).
23. H. A. Szymanski, Infrared Band Handbook (Plenum, New York, 1963).
24. B. Dischler, in Amorphous Hydrogenated Carbon Films, Proceedings of the European Materials Research Society Symposium, edited by P. Koidl and P. Oelhqen (Les Editions de Physique, Paris, 1987), Vol. 17, p. 219.
25. J. Ristein, R. T. Stief, L. Ley, and W. Beyer, J. Appl. Phys. 84, 3836 (1998).
26. D. M. Smith and A. R. Chughtai, Colloids Surf., A 105, 47 (1995).
27. P. E. Fanning and M. A. Vannice, Carbon 31, 721 (1993).
28. C. Ruggiero and P. Collins, Surf. Sci. 377-379, 583 (1997).
29. F. Boccuzzi, A. Chiorino, S. Tsubota, and M. Haruta, J. Phys. Chem. 10, 3625 (1996).
30. N. A. Morrison, S. Muhl, S. E. Rodil, A. C. Ferrari, M. Nesladek, W. I. Milne, and J. Robertson, Phys. Status Solidi A 172, 172 (1999).
31. Z. Zhang and Y. Nakayama, J. Appl. Phys. 82, 4912 (1997).
32. C. Oppedisamo and A. Tagliaferro, Appl. Phys. Lett. 75, 3650 (1999).
33. K. Tanaka and N. Mutsukura, Plasma Chem. Plasma Process. 19, 217 (1999).
34. E. Braca, G. Saraceni, J. M. Kenny, L. Lozzi, and S. Santucci, Thin Solid Films 415, 195 (2002).
35. C. W. Chen and J. Robertson, J. Non-Cryst. Solids 227-228, 602 (1998).
36. M. A. Tamor and W. C. Vassel, J. Appl. Phys. 76, 3823 (1994).
37. M. Weiler, S. Sattel, T. Giessen, K. Jung, H. Ehrhardt, V. S. Veerasamy, and J. Robertson, Phys. Rev. B 53, 1594 (1996).
38. M. A. Tamor, W. C. Vassell, and K. R. Carduner, Appl. Phys. Lett. 58, 592 (1991).
39. D. Dasgupta, F. Dernichelis, C. F. Pirri, and A. Tagliaferro, Phys. Rev. B 43, 2131 (1991).
40. G. Fanchini, A. Tagliaferro, D. P. Dowling, K. Donnelly, M. L. McConnell, R. Flood, and G. Lang, Phys. Rev. B 61, 5002 (2000).
41. T. Schwarz-Sellinger, A. von Keudell, and W. Jacob, J. Appl. Phys. 86, 3968 (1999).
42. D. L. Smith, Thin Film Deposition (McGraw-Hill, New York, 1995).
43. J. P. Sullivan, T. A. Friedmann, and A. G. Baca, J. Electron. Mater. 26, 1021 (1997).
44. P. D. Dowling, K. Donnelly, M. Monclus, and M. McGuinness, Diamond Relat. Mater. 7, 432 (1998).
45. N. Wada, P. J. Gaczi, and A. Solin, J. Non-Cryst. Solids 35-36, 543 (1980).
46. S. Prawer, K. W. Nugent, Y. Lifshitz, G. D. Lempert, E. Grossman, J. Kulik, I. Avigal, and R. Kalish, Diamond Relat. Mater. 5, 433 (1996).
47. F. Demichelis, Y. Liu, and A. Tragliaferro, Solid State Commun. 100, 475 (1995).