Electrochemistry of nitrogen-incorporated hydrogenated amorphous carbon films

Journal of the Electrochemical Society

Volumn 149, Issue 7, 2002, Pages

  Cachet, H ^a   Deslouis, C ^a   Chouiki, M ^a   Saidani, B ^a   Conway, N M J ^b   Godet, C ^b  

^a Université Pierre et Marie Curie   (France)

^b LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CYCLIC VOLTAMMETRY; DIAMOND LIKE CARBON FILMS; DOPING (ADDITIVES); ELECTRON TRANSITIONS; FILM GROWTH; HYDROGENATION; INTERFACES (MATERIALS); NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; RATE CONSTANTS; REDOX REACTIONS; SOLUTIONS; SUBSTRATES; SYNTHESIS (CHEMICAL);

AMORPHOUS DIAMONDS;

ELECTROCHEMISTRY;

EID: 0036641651     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1479160     Document Type: Article

References (10)