메뉴 건너뛰기




Volumn 110, Issue 1-3, 2004, Pages 407-412

Sealing of adhesive bonded devices on wafer level

Author keywords

Adhesive bonding; Benzocyclobutene; Hermetic sealing; Wafer level encapsulation

Indexed keywords

ADHESIVES; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRIC POTENTIAL; ETCHING; HERMETIC DEVICES; INTERCONNECTION NETWORKS; MICROELECTROMECHANICAL DEVICES; SEALING (CLOSING); SILICON NITRIDE;

EID: 1642566508     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2003.06.003     Document Type: Conference Paper
Times cited : (59)

References (21)
  • 1
    • 0036255968 scopus 로고    scopus 로고
    • A monolithic fully-integrated vacuum-sealed CMOS pressure sensor
    • Chavan A.V., Wise K.D. A monolithic fully-integrated vacuum-sealed CMOS pressure sensor. IEEE Trans. Electron devices. 49(1):2002;164-169.
    • (2002) IEEE Trans. Electron Devices , vol.49 , Issue.1 , pp. 164-169
    • Chavan, A.V.1    Wise, K.D.2
  • 3
    • 0027609536 scopus 로고
    • Design of sealed cavity microstructures formed by silicon wafer bonding
    • Huff M.A., Nikolich A.D., Schmidt M.A. Design of sealed cavity microstructures formed by silicon wafer bonding. J. Microelectromech. Syst. 2(2):1993;74-81.
    • (1993) J. Microelectromech. Syst. , vol.2 , Issue.2 , pp. 74-81
    • Huff, M.A.1    Nikolich, A.D.2    Schmidt, M.A.3
  • 6
    • 0033149765 scopus 로고    scopus 로고
    • Sealing of micromachinged cavities using chemical vapor deposition methods: Characterization and optimization
    • Liu Ch., Tai Y.-Ch. Sealing of micromachinged cavities using chemical vapor deposition methods: characterization and optimization. J. Microelectromech. Syst. 8(2):1999;135-145.
    • (1999) J. Microelectromech. Syst. , vol.8 , Issue.2 , pp. 135-145
    • Liu, Ch.1    Tai, Y.-Ch.2
  • 8
    • 0028529149 scopus 로고
    • Electrostatically driven vacuum-encapsulated polysilicon resonators. Part I. Design and fabrication
    • Lengtenberg R., Tilmans H.A.C. Electrostatically driven vacuum-encapsulated polysilicon resonators. Part I. Design and fabrication. Sens. Actuators A. 45:1994;57-66.
    • (1994) Sens. Actuators A , vol.45 , pp. 57-66
    • Lengtenberg, R.1    Tilmans, H.A.C.2
  • 10
    • 0031177094 scopus 로고    scopus 로고
    • Low-temperature intermediate Au-Si wafer bonding; Eutectir or silicide bond
    • Wolffenbuttel R.F. Low-temperature intermediate Au-Si wafer bonding; eutectir or silicide bond. Sens. Actuators A. 62:1997;680-686.
    • (1997) Sens. Actuators A , vol.62 , pp. 680-686
    • Wolffenbuttel, R.F.1
  • 11
    • 0033904174 scopus 로고    scopus 로고
    • Localized silicon fusion and eutectic bonding for MEMS fabrication and packaging
    • Cheng Y.T., Lin L., Najafi K. Localized silicon fusion and eutectic bonding for MEMS fabrication and packaging. J. Microelectromech. Syst. 9(1):2000;3-8.
    • (2000) J. Microelectromech. Syst. , vol.9 , Issue.1 , pp. 3-8
    • Cheng, Y.T.1    Lin, L.2    Najafi, K.3
  • 12
    • 0033727437 scopus 로고    scopus 로고
    • Fabrication and hermeticity testing of a glass-silicon package formed using localized aluminum/silicon-to-glass bonding
    • Y.T. Cheng, L. Lin, K. Najafi, Fabrication and hermeticity testing of a glass-silicon package formed using localized aluminum/silicon-to-glass bonding, Proc. MEMS (2000) 757-762.
    • (2000) Proc. MEMS , pp. 757-762
    • Cheng, Y.T.1    Lin, L.2    Najafi, K.3
  • 14
    • 0035425913 scopus 로고    scopus 로고
    • Low temperature full wafer adhesive bonding of structured wafers
    • Niklaus F., et al. Low temperature full wafer adhesive bonding of structured wafers. Sens. Actuators A. 92:2001;235-241.
    • (2001) Sens. Actuators A , vol.92 , pp. 235-241
    • Niklaus, F.1
  • 15
    • 0041431012 scopus 로고    scopus 로고
    • Selective wafer level adhesive bonding with Benzocyclobutene for fabrication of cavities
    • Oberhammer J., Niklaus F., Stemme G. Selective wafer level adhesive bonding with Benzocyclobutene for fabrication of cavities. Sensors and Actuators A. 105(3):2003;297-304.
    • (2003) Sensors and Actuators A , vol.105 , Issue.3 , pp. 297-304
    • Oberhammer, J.1    Niklaus, F.2    Stemme, G.3
  • 19
    • 0029459276 scopus 로고
    • Hydrogen diffusion and redistribution
    • PECVD Si-rich silicon nitride during rapid thermal annealing
    • S.S. He, V.L. Shannon, Hydrogen diffusion and redistribution, in: PECVD Si-rich silicon nitride during rapid thermal annealing, in: Proceedings of the Solid-State and Integrated Circuit Technology, 1995, pp. 269-271.
    • (1995) Proceedings of the Solid-State and Integrated Circuit Technology , pp. 269-271
    • He, S.S.1    Shannon, V.L.2
  • 20
    • 0026398564 scopus 로고
    • PECVD silicon nitride postbond films for protecting bondpads, bonds and bondwires from corrosion failure
    • R.K. Ulrich, et al., PECVD silicon nitride postbond films for protecting bondpads, bonds and bondwires from corrosion failure, in: Proceedings of the Electronic Components and Technology Conference, 1991, pp. 738-744.
    • (1991) Proceedings of the Electronic Components and Technology Conference , pp. 738-744
    • Ulrich, R.K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.