Nanometric artificial structuring of semiconductor surfaces for crystalline growth

Comptes Rendus Physique

Volumn 6, Issue 1 SPEC. ISS., 2005, Pages 105-116

  Eymery, J ^a   Biasiol, G ^b,d   Kapon, E ^b   Ogino, T ^c  

^a CEA GRENOBLE   (France)

^b EPFL   (Switzerland)

^c YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^d LABORATORIO TASC   (Italy)

Author keywords

Epitaxial growth; Self assembling; Strain and curvature engineering; Surface nanopatterning

Indexed keywords

EID: 13644277376     PISSN: 16310705     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.crhy.2004.11.006     Document Type: Short Survey

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