Step arrangement design and nanostructure self-organization on Si surfaces

Applied Surface Science

Volumn 117-118, Issue , 1997, Pages 642-651

  Ogino, Toshio ^a   Hibino, Hiroki ^a   Homma, Yoshikazu ^b  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

^b NTT CORPORATION   (Japan)

Author keywords

Atomic step; Nanofabrication; Self organization; Silicon; Surface

Indexed keywords

ANNEALING; CRYSTAL ORIENTATION; NANOSTRUCTURED MATERIALS; SEMICONDUCTING SILICON;

NANOSTRUCTURE SELF ORGANIZATION;

WSI CIRCUITS;

EID: 4244159584     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)80158-4     Document Type: Article

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