Cathodoluminescence and electron field emission of boron-doped a-C:N films

Carbon

Volumn 43, Issue 4, 2005, Pages 820-826

  Hsieh, Wei Jen ^a   Lai, Shih Hsiang ^a   Chan, Lih Hsiung ^a   Chang, Ku Ling ^a   Shih, Han C ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

C. Atomic force microscopy; D. Luminescence, Electrical properties, Optical properties, Field emission

Indexed keywords

ATOMIC FORCE MICROSCOPY; BORON; CARBON NITRIDE; CATHODOLUMINESCENCE; ELECTRIC PROPERTIES; ELECTRON EMISSION; MORPHOLOGY; OPTICAL PROPERTIES; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING; SPECTROMETERS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE FILMS; ELECTRON EXCITATION; ELECTRON FIELD EMISSION; LUMINESCENCE INTENSITY;

THIN FILMS;

EID: 13544260604     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2004.11.013     Document Type: Article

References (31)

1. S. Umeda, T. Yuki, T. Sugiyama, and T. Sugino Boron carbon nitride film with low dielectric constant as passivation film for high speed electronic devices Diamond Relat. Mater. 13 2004 1135 1138
2. T. Sugiyama, T. Tai, and T. Sugino Effect of annealing on dielectric constant of boron carbon nitride films synthesized by plasma-assisted chemical vapor deposition Appl. Phys. Lett. 80 22 2002 4214 4216
3. S.C. Chien, S. Chattopadhyay, L.C. Chen, S.T. Lin, and K.H. Chen Mechanical properties of amorphous boron carbon nitride films produced by dual gun sputtering Diamond Relat. Mater. 12 2003 1463 1471
4. M. Dinescu, A. Perrone, A.P. Caricato, L. Mirenghi, C. Gerardi, and C. Ghica Boron carbon nitride films deposited by sequential pulses laser deposition Appl. Surf. Sci. 127-129 1998 692 696
5. D.H. Kim, E. Byon, S. Lee, J.K. Kim, and H. Ruh Characterization of ternary boron carbon nitride films synthesized by RF magnetron sputtering Thin Solid Films 447-448 2004 192 196
6. H. Yokomichi, T. Funakawa, and A. Masuda Preparation of boron-carbon-nitrogen thin films by magnetron sputtering Vacuum 66 2002 245 249
7. T. Sugino, and H. Hieda Field emission characteristics of boron carbon nitride films synthesized by plasma-assisted chemical vapor deposition Diamond Relat. Mater. 9 2000 1233 1237
8. T. Yuki, S. Umeda, and T. Sugino Electrical and optical characteristics of boron carbon nitride films synthesized by plasma-assisted chemical vapor deposition Diamond Relat. Mater. 13 2004 1130 1134
9. 2N thin films Thin Solid Films 281-282 1996 334 336
10. G. Fanchini, S.C. Ray, and A. Tagliaferro Photoluminescence investigation of carbon nitride-based films deposited by reactive sputtering Diamond Relat. Mater. 12 2003 1084 1087
11. M. Zhang, Y. Nukayama, and S. Harada Photoluminescence of hydrogenated amorphous carbon nitride films after ultraviolet light irradiation and thermal annealing J. Appl. Phys. 86 9 1999 4971 4977
12. J.Y. Sze, B.K. Tay, D. Sheeja, S.P. Lau, Y.Q. Fu, and D.H.C. Chua Optical and electrical properties of amorphous carbon films deposited using filtered cathodic vacuum arc with pulse biasing Thin Solid Films 447-448 2004 148 152
13. K.B.K. Teo, S.E. Rodil, J.T.H. Tsai, A.C. Ferrari, J. Robertson, and W.I. Milne Effect of graphitic inclusions on the optical gap of tetrahedral amorphous carbon films J. Appl. Phys. 89 7 2001 3706 3710
14. S.E. Rodil, S. Muhl, S. Maca, and A.C. Ferrari Optical gap in carbon nitride films Thin Solid Films 433 2003 119 125
15. G.A.J. Amaratunga, and S.R.P. Silva Nitrogen containing hydrogenated amorphous carbon for thin-film field emission cathodes Appl. Phys. Lett. 68 18 1996 2529 2531
16. M. Tabbal, P. Merel, S. Moisa, M. Chaker, A. Ricard, and M. Moisan X-ray photoelectron spectroscopy of carbon nitride films deposited by graphite laser ablation in a nitrogen postdischarge Appl. Phys. Lett. 69 12 1996 1698 1700
17. M.N. Oliveira, A.M. Botelho, and O. Conde XPS investigation of BxNyCz coatings deposited by laser assisted chemical vapor deposition Surf. Coat. Technol. 100-101 1998 398 403
18. Z.F. Zhou, I. Bello, M.K. Lei, K.Y. Li, C.S. Lee, and S.T. Lee Synthesis and characterization of boron carbon nitride films by radio frequency magnetron sputtering Surf. Coat. Technol. 128-129 2000 334 340
19. Y. Wada, Y.K. Yap, M. Yoshimura, Y. Mori, and T. Sasaki The control of B-N and B-C bonds in BCN films synthesized using pulsed laser deposition Diamond Relat. Mater. 9 2000 620 624
20. M.A. Tamor, and W.C. Vassell Raman "fingerprinting" of amorphous carbon films J. Appl. Phys. 76 1994 3823 3830
21. D.L. Vien, N.B. Colthup, W.G. Fateley, and T.G. Grasselli The Handbook of Infrared and Raman Characteristic Frequencies of Organic Molecules 1991 Academic Press, Inc.
22. A. Heilmann, P. Jutzi, A. Klipp, U. Kreibig, R. Neuendorf, and T. Sawitowski Photoluminescent siloxenes in nanoporous aluminum oxide Adv. Mater. 10 5 1998 398 401
23. Y. Kusano, J.E. Evetts, and I.M. Hutchings Deposition of boron carbon nitride films by dual cathode magnetron sputtering Thin Solid Films 343-344 1999 250 253
24. T. Sugino, Y. Etou, T. Tai, and H. Mori Dielectric constant of boron carbon nitride films synthesized by plasma-assisted chemical-vapor deposition Appl. Phys. Lett. 80 4 2002 649 651
25. K. Nakamura Preparation and properties of boron nitride films by metal organic chemical vapor deposition J. Electrochem. Soc. 133 1986 1120 1123
26. T.H. Yuzuriha, and D.W. Hess Structural and optical properties of plasma-deposited boron nitride films Thin Solid Films 140 1986 199 207
27. J. Robertson Recombination and photoluminescence mechanism in hydrogenated amorphous carbon Phys. Rev. B 53 24 1996 16302 16305
28. W.J. Hsieh, C.C. Lin, U.S. Chen, Y.S. Chang, and H.C. Shih Cathodoluminescence of the a-C:N films deposited by a filtered cathodic arc plasma system Diamond Relat Mater 14 2005 93 97
29. R.H. Fowler, and L. Nordheim Electron emission in intense electric fields Proc. Roy. Soc. Lond. A 119 781 1928 173 181
30. X.W. Liu, L.H. Chan, W.J. Hsieh, J.H. Lin, and H.C. Shih The effect of argon on the electron field emission properties of a-C:N thin films Carbon 41 2003 1143 1148
31. L.H. Chan, K.H. Hong, D.Q. Xiao, W.J. Hsieh, S.H. Lai, and H.C. Shih Role of extrinsic atoms on the morphology and field emission properties of carbon nanotubes Appl. Phys. Lett. 82 24 2003 4334 4336