SCOPUS 정보 검색 플랫폼

Vacuum

Volumn 66, Issue 3-4, 2002, Pages 245-249

Preparation of boron-carbon-nitrogen thin films by magnetron sputtering

(3) Yokomichi, H a Funakawa, T a Masuda, A b

a TOYAMA PREFECTURAL UNIVERSITY (Japan)

b JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; ELECTRON SPIN RESONANCE SPECTROSCOPY; INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; PHYSICAL VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

BORON-NITRIDE PELLETS;

THIN FILMS;

EID: 0037136176 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/S0042-207X(02)00149-5 Document Type: Article

Times cited : (11)

References (14)

1
- 0041436868
- (1986) J Chem Soc Chem Commun , pp. 1758
- Kouvetakis, J.¹ Kaner, R.B.² Sattler, M.L.³ Bartlett, N.⁴

2
- 0023311816
- (1987) Mat Res Bull , vol.22 , pp. 399
- Kaner, R.B.¹ Kouvetakis, J.² Warble, C.E.³ Sattler, M.L.⁴ Bartlett, N.⁵

3
- 21544479071
- (1995) J Appl Phys , vol.78 , pp. 2880
- Watanabe, M.O.¹ Itoh, S.² Mizushima, K.³

4
- 0000164362
- (1999) Appl Phys Lett , vol.74 , pp. 2948
- Yu, J.¹ Wang, E.G.²

5
- 0032377918
- (1998) J Vac Sci Technol A , vol.15 , pp. 2896
- Tempez, A.¹ Badi, N.² Bensaoula, A.³ Kulik, J.⁴

6
- 0032132449
- (1998) J Appl Phys , vol.84 , pp. 1412
- Yao, B.¹ Chen, W.J.² Liu, L.³ Ding, B.Z.⁴ Su, W.H.⁵

7
- 35949006917
- (1995) Phys Rev B , vol.51 , pp. 11229
- Weng-Sieh, Z.¹ Cherrey, K.² Chopra, N.G.³ Blase, X.⁴ Miyamoto, Y.⁵ Rubio, A.⁶ Cohen, M.L.⁷ Louie, S.⁸ Zettl, G.⁹ Gronsky, A.¹⁰

8
- 0030603948
- (1996) Chem Phys Lett , vol.260 , pp. 465
- Redlich, P.¹ Loeffler, J.² Ajayan, P.M.³ Bill, J.⁴ Aldinger, F.⁵ Ruhle, M.⁶

9
- 0030564769
- (1996) Chem Phys Lett , vol.257 , pp. 576
- Terrones, M.¹ Benito, A.M.² Manteca-Diego, C.³ Hsu, W.K.⁴ Osman, O.I.⁵ Hare, J.P.⁶ Reid, D.G.⁷ Terrones, H.⁸ Cheetham, A.K.⁹ Prassides, K.¹⁰ Kroto, H.W.¹¹ Walton, D.R.M.¹²

10
- 0032495928
- (1998) Chem Phys Lett , vol.287 , pp. 671
- Sen, R.¹ Satishkumar, B.C.² Govindaraj, A.³ Harikumar, K.R.⁴ Raina, G.⁵ Zhang, J.P.⁶ Cheetham, A.K.⁷ Rao, C.N.R.⁸

11
- 84994472306
- (2000) Chem Phys Lett , vol.323 , pp. 592
- Yu, J.¹ Bai, X.D.² Ahn, J.³ Yoon, S.F.⁴ Wang, E.G.⁵

12
- 0032155177
- (1998) Jpn J Appl Phys , vol.37 , pp. 4722
- Yokomichi, H.¹ Sakima, H.² Masuda, A.³

13
- 0039803536
- (1998) J Vac Sci Technol A , vol.16 , pp. 1331
- Otano-Rivera, W.¹ Pilione, L.J.² Zapien, J.A.³ Messier, R.⁴

14
- 0000084722
- (1994) Appl Phys Lett , vol.65 , pp. 1757
- Deshpande, S.V.¹ Gulari, E.² Harris, S.J.³ Weiner, A.M.⁴

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