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Volumn 242, Issue 3-4, 2005, Pages 419-427

Microscale chemical and electrostatic surface patterning of Dow Cyclotene by N 2 plasma

Author keywords

AFM; Dow Cyclotene; Microscale chemical and electrostatic patterning; N 2 plasma treatment; Surface chemical modification; TOF S SIMS; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL MODIFICATION; ELECTROSTATICS; FRICTION; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PLASMAS; SECONDARY ION MASS SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 13444262236     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.09.077     Document Type: Article
Times cited : (2)

References (36)
  • 5
    • 0032053089 scopus 로고    scopus 로고
    • A.S. Blawas, and W.M. Reichert Biomaterials 19 1998 595; R.S. Kane, S. Takayama, E. Ostuni, D.E. Ingber, and G.M. Whitesides Biomaterials 20 1999 2363
    • (1998) Biomaterials , vol.19 , pp. 595
    • Blawas, A.S.1    Reichert, W.M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.