Influence of Ar ion-beam assistance and annealing temperatures on properties of TiO2 thin films deposited by reactive DC magnetron sputtering

Thin Solid Films

Volumn 475, Issue 1-2 SPEC. ISS., 2005, Pages 155-159

  Kim, Sung Hwa ^a   Hwangbo, Chang Kwon ^a  

^a Inha University   (South Korea)

Author keywords

DC; Ion beam deposition; Magnetron; Reactive sputtering; Titanium oxide

Indexed keywords

ARGON; ION BEAM ASSISTED DEPOSITION; ION BEAMS; ION BOMBARDMENT; MAGNETRON SPUTTERING; OPACITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; REFRACTIVE INDEX; SPECTROPHOTOMETERS; TITANIUM OXIDES;

ATOMIC LAYER DEPOSITION; DC MAGNETRON SPUTTERING; ION-BEAM DEPOSITION; REACTIVE SPUTTERING;

THIN FILMS;

EID: 13444249754     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.08.035     Document Type: Conference Paper

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