Some properties of TiO2-layers prepared by mid-frequency and dc reactive magnetron sputtering

Journal of Non-Crystalline Solids

Volumn 218, Issue , 1997, Pages 262-266

  Szczyrbowski, J ^a   Brauer G ^a   Ruske, M ^a   Teschner, G ^a   Zmelty, A ^a  

^a EVONIK INDUSTRIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

GLASS; MAGNETRON SPUTTERING; OPTICAL VARIABLES MEASUREMENT; REFRACTIVE INDEX; SPUTTER DEPOSITION; SURFACE STRUCTURE; THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

REACTIVE SPUTTERING;

OPTICAL FILMS;

EID: 0031549366     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(97)00239-1     Document Type: Article

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