Thermally stable narrow-bandpass filter prepared by reactive ion-assisted sputtering

Applied Optics

Volumn 40, Issue 10, 2001, Pages 1593-1598

  Tsai, Rung Ywan ^a,b   Chang, Chia Shy ^a   Chu, Cheng Wei ^a   Chen, Tzushin ^a   Dai, Fred ^a   Lin, Doris ^a   Yan, Shao Feng ^a   Chang, Albert ^a  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b WALSIN TECHNOLOGY CORPORATION   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETRON SPUTTERING; OPTICAL COMMUNICATION; REACTIVE ION ETCHING; SEMICONDUCTING GLASS; SILICA; SPUTTER DEPOSITION; TANTALUM COMPOUNDS; THERMODYNAMIC STABILITY;

ION ASSISTED SPUTTERING;

BANDPASS FILTERS;

EID: 0010916016     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.40.001593     Document Type: Article

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