Temperature-stable bandpass filters deposited with plasma ion-assisted deposition

Applied Optics

Volumn 35, Issue 28, 1996, Pages 5609-5612

  Zoller A ^a   Gotzelmann R ^a   Matl, K ^a   Cushing, D ^b  

^a JDS Fitel ^*  (Germany)

^b JDS UNIPHASE   (United States)

Author keywords

Ion assisted deposition of metal oxides; Narrow bandpass filters; Plasma ion assisted deposition; Temperature stable interference coatings

Indexed keywords

EID: 6144250894     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.35.005609     Document Type: Article

References (5)

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2. P. J. Martin and R. P. Netterfield, “Optical films produced by ion-based techniques,” in Progress in Optics, E. Wolf, ed. (Elsevier, Amsterdam, 1986), Vol. XXIII, Chap. 3.
3. K. Matl, R. Gotzelmann, and A. Zoller, “Ion assisted deposition with a new plasma source,” Mater. Sci. Eng. A 140, 523-537 (1991).
4. A. Zoller, S. Beisswenger, R. Gotzelmann, and K. Matl, “Plasmaion assisted deposition: a novel technique for the production of optical coatings,” in Optical Interference Coatings, F. Abeles, ed., Proc. SPIE 2253, 394-402 (1994).
5. G. Hass and R. E. Thun, Physics of Thin Films (Academic, New York, 1966), Vol. 3, pp. 219-253.