Electrical properties of PZT thin films by photochemical deposition

Thin Solid Films

Volumn 447-448, Issue , 2004, Pages 669-673

  Park, Hyeong Ho ^a   Yoon, Sook ^a   Park, Hyung Ho ^a   Hill, Ross H ^b  

^a Yonsei University   (South Korea)

^b SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Photochemical reaction; PZT; Self patterning; UV exposure

Indexed keywords

COERCIVE FORCE; CONDENSATION; CRYSTAL DEFECTS; CRYSTAL ORIENTATION; CRYSTALLIZATION; HYDROLYSIS; HYSTERESIS; LEAD COMPOUNDS; LEAKAGE CURRENTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOCHEMICAL REACTIONS; POLARIZATION; SOL-GELS; ULTRAVIOLET RADIATION;

LIGANDS; PRECURSORS;

THIN FILMS;

EID: 1342281243     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.09.005     Document Type: Conference Paper

References (21)

1. Funakubo H., Tokita K., Oikawa T., Aratani M., Saito K. Appl. Phys. Lett. 92:2002;5448.
2. Hong J., Song H.W., Hong S., Shin H., No K. J. Appl. Phys. 92:2002;7434.
3. Tokita K., Aratani M., Funakubo H. Appl. Phys. Lett. 81:2002;898.
4. Lee J.-K., Joo S.-K. Appl. Phys. Lett. 81:2002;2602.
5. Ricinschi D., Okuyama M. Appl. Phys. Lett. 81:2002;4040.
6. Lee J.K., Kim T., Chung I., Desu S.B. Appl. Phys. Lett. 75:1999;334.
7. Soyer C., Cattan E., Remiens D., Guilloux-Viry M. J. Appl. Phys. 92:2002;1048.
8. Ching C.L.W., Hill R.H. J. Vac. Sci. Technol. A. 16:1998;897.
9. Bravo-Vasquez J.P., Hill R.H. Polyhedron. 19:2000;343.
10. Gao M., Hill R.H. J. Mater. Res. 13:1998;1379.
11. Avey A.A., Hill R.H. J. Am. Chem. Soc. 118:1996;237.
12. Law W.L., Hill R.H. Thin Solid Films. 375:2000;42.
13. Krupanidhi S.B., Hu H., Kumar V. J. Appl. Phys. 71:(1):1992;376.
14. Wang F.-P., Yu Y.-J., Jiang Z.-H., Zhao L.-C. Mater. Chem. Phys. 77:2002;10.
15. Zhang J.-Y., Boyd I.W. Jap. J. Appl. Phys., Part 2, Part A. 4:1999;L393.
16. Ha S.-M., Kim W.S., Park H.-H., Kim T.S. Ferroelectrics. 273:2002;35.
17. Chen S.Y., Chen I.W. J. Am. Ceram. Soc. 81:1998;97.
18. Cho C.-R., Francis L.F., Jang M.-S. Jap. J. Appl. Phys., Part 2, Part A. 7:1999;L751.
19. Yang J.-K., Kim W.S., Park H.-H. Thin Solid Films. 377-378:2000;739.
20. Stolichnov I., Tagantsev A., Setter N., Okhonin S., Fazan P., Cross J.S., Tsukada M. J. Appl. Phys. 87:2000;1925.
21. Ha S.-M., Kim D.-H., Park H.-H., Kim T.-S. Thin Solid Films. 355-356:1999;525.