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Volumn 81, Issue 5, 2002, Pages 898-900

Effect of atmosphere during heating of substrate on the low temperature deposition of metalorganic chemical vapor deposited Pb(Zrx,Ti 1-x)O3 thin films

(3) Tokita, Kouji a Aratani, Masanori a Funakubo, Hiroshi a

a Tokyo Institute of Technology ^* (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS PHASE; CHEMICAL VAPOR DEPOSITED; LOW DEPOSITION TEMPERATURE; LOW-LEAKAGE CURRENT; LOW-TEMPERATURE DEPOSITION; METAL-ORGANIC; PZT; PZT FILM; SMOOTH SURFACE;

AMORPHOUS FILMS; ARGON; FERROELECTRICITY; HEATING; LEAD; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ZIRCONIUM;

SUBSTRATES;

EID: 79956008261 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1497446 Document Type: Article

Times cited : (15)

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