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Volumn 81, Issue 5, 2002, Pages 898-900
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Effect of atmosphere during heating of substrate on the low temperature deposition of metalorganic chemical vapor deposited Pb(Zrx,Ti 1-x)O3 thin films
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS PHASE;
CHEMICAL VAPOR DEPOSITED;
LOW DEPOSITION TEMPERATURE;
LOW-LEAKAGE CURRENT;
LOW-TEMPERATURE DEPOSITION;
METAL-ORGANIC;
PZT;
PZT FILM;
SMOOTH SURFACE;
AMORPHOUS FILMS;
ARGON;
FERROELECTRICITY;
HEATING;
LEAD;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
ZIRCONIUM;
SUBSTRATES;
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EID: 79956008261
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1497446 Document Type: Article |
Times cited : (15)
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References (11)
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