High efficiency photoresist-free lithography of UO3 patterns from amorphous films of uranyl complexes

Journal of Materials Research

Volumn 13, Issue 5, 1998, Pages 1379-1389

  Gao, M ^a   Hill, Ross H ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008140226     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1998.0196     Document Type: Article

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