Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 639-645

  Naulleau, P ^a   Goldberg, K A ^a   Anderson, E H ^a   Batson, P ^a   Denham, P ^a   Jackson, K ^a   Rekawa, S ^a   Bokor, J ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Decoherentizing illuminator; EUV diffuser; Extreme ultraviolet lithography; Synchrotron radiation, microfield printing

Indexed keywords

COHERENT LIGHT; DIFFRACTION; DIFFUSERS (OPTICAL); PHASE SHIFT; PHOTOLITHOGRAPHY; PRINTING; SYNCHROTRON RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; MICROFIELD PRINTING;

INTERFEROMETERS;

EID: 0034757349     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436633     Document Type: Conference Paper

References (17)

1. The elusive diffraction limit
2. Layered synthetic microstructures as Bragg diffractors for X rays and extreme ultraviolet: Theory and predicted performance
3. Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography
4. Phase-shifting point diffraction interferometer
5. Extreme-ultraviolet phase-shifting point diffraction interferometer: A wave-front metrology tool with sub-angstrom reference-wave accuracy
6. Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry
7. EUV interferometric measurements of diffraction-limited optics
8. Extreme ultraviolet alignment and testing of a four mirror aspheric extreme ultraviolet optical system
9. Development and characterization of a 10× Schwarzschild system for SXPL
10. Sub-100-nm imaging with an EUV 10x microstepper
11. EUV optical design for a 100 nm CD imaging system
12. EUV engineering test stand
13. EUV interferometry of a four-mirror ring field EUV optical system
14. Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions
15. Spatial coherence characterization of undulator radiation
16. Stochastic model for thin film growth and erosion