Study of plasma-deposited amorphous SiO2 films using infrared absorption techniques

Thin Solid Films

Volumn 384, Issue 2, 2001, Pages 195-199

  He, LeNian ^a   Hasegawa, Seiichi ^b  

^a ZHEJIANG UNIVERSITY   (China)

^b KANAZAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; CHEMICAL BONDS; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT ABSORPTION; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILANES; SILICA;

INFRARED ABSORPTION;

AMORPHOUS FILMS;

EID: 0034831484     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01873-3     Document Type: Article

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