Liquid-injection system based on mass flow controllers

Solid State Technology

Volumn 39, Issue 3, 1996, Pages 149-152

  Boer, Hendrik Jan ^a,b  

^a Bronkhorst High Tech BV   (Netherlands)

^b UNIVERSITY OF GRONINGEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

BUBBLE FORMATION; CONTROL EQUIPMENT; FLOW CONTROL; FLOW MEASUREMENT;

CONTROLLED EVAPORATOR MIXER LIQUID INJECTION SYSTEM; MASS FLOW CONTROLLERS;

CHEMICAL VAPOR DEPOSITION;

EID: 0039356993     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (7)

1. US Patent No. 5,361,1,800.
2. US Patent No. 5,204,314.
3. H.J. Boer. 'A new approach for measuring very small liquid flows,' Proceeding of SENSOR 95, pg. 97-102, Nuremberg (May 10-15, 1995).
4. US Patent No. 5,431,736.
5. J. F. Loan, J. Sullivan ,Advanced Materials Delivery in CVD Processing,' Semiconductor Intermational, (July 1995).
6. John A.T. Noroman, et al., 'Triakylamine adducts of dimethylaluminum hydride as precursors for CVD aluminum,' presented at Advanced Metallization and Interconnect Systems for VLSI Application, Portland, OR (Oct 3-5, 1995).
7. J. Rober, C. Kaufman, T. Gessner, 'Structure and electrical properties of thin copper films deposited by MOCVD,' presented at MAM '95, Radebeul, Germany (March 19-22, 1995).