Photonic crystals built by three-dimensional additive lithography enable integrated optics of high density

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2849, Issue , 1996, Pages 248-256

  Koops, Hans W P ^a  

^a DEUTSCHE TELEKOM LABORATORIES   (Germany)

Author keywords

Integrated optics of high density; Photonic crystals; Three dimensional additive lithography; Tunable optical filters

Indexed keywords

ADDITIVES; ASPECT RATIO; CHROMIUM COMPOUNDS; CRYSTAL IMPURITIES; DEPOSITION; FLIGHT CONTROL SYSTEMS; INTEGRATED OPTICS; LIGHT; LITHOGRAPHY; MATERIALS PROPERTIES; OPTICAL SWITCHES; PHOTOREACTIVITY; PIXELS; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; WAVEGUIDE FILTERS;

3-DIMENSIONAL STRUCTURES; ADDITIVE LITHOGRAPHIES; DEPOSITION CONDITIONS; ELECTRON BEAM-INDUCED DEPOSITION; NON-LINEAR OPTICAL MATERIAL; PRECURSOR MATERIALS; TUNABLE OPTICAL FILTERS; TWO-DIMENSIONAL ARRAYS;

PHOTONIC CRYSTALS;

EID: 58749099104     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.255489     Document Type: Conference Paper

References (29)

1. S. John, Phys. Rev. Lett, 58, 2486 (1987)
2. E. Yablonovitch, Phys. Rev. Lett. 58, 2058 (1987)
3. S.L. McCall, P.M. Platzmann, R. Dalichaouch, D. Smith, S. Schulz, Phys. Rev. Lett. 67, 2017 (1991)
4. K.M. Leung, Y.F. Liu, Phys. Rev. Lett. 65, 2646 (1990)
5. S.L. McCall, A.F.J. Levi, R.E. Slusher, S.J. Pearton, R.A. Logan, Appl. Phys. Lett. 60, 289 (1992)
6. E. Yablonovitch, T.M. Gmitter, Phys. Rev. Lett. 63, 1950 (1989)
7. E. Yablonovitch, T.M. Gmitter, K.M. Leung, Phys. Rev. Lett. 67, 2295 (1991)
8. K.M. Ho, C. T. Chan, C.M. Soukoulis, Phys. Rev. Lett. 65, 3152 (1990)
9. S.Y. Lin, A. Arjavalingam, J. Opt. Soc. Am. B / Vol. 11, No. 10, 2124 (1994)
10. S.Y. Lin, G. Arjavalingam, Optics Letters Vol. 18, No 19, 1666 (1993)
11. P. Villneuve, MIT, private communication
12. D.R. Smith, S. Schulz, S.L. McCall, P.M. Platzmann, Journal of Modern Optics Vol. 41, 2, p. 395 (1994)
13. G. Feiertag, W. Ehrfeld, H. Freimuth, G. Kiriakidis, H. Lehr, T. Pedersen, M. Schmidt, C. Soukoulis, R. Weiel, NATO ASI-Series E, Vol. 315, 63 (1996) (C.M. Soukoulis ed.)
14. V. Lehmann, J. Electrochem. Soc., Vol 140, No. 10, 2836 (1993)
15. U. Grüning, V. Lehmann, S. Ottow, K. Busch, Appl. Phys. Lett. 68 (6) p. 747(1996)
16. CC. Cheng, A. Scherer, J. Vac. Sci. Technol. B Vol. 13, No. 6, 2696 (1995)
17. H.W.P. Koops, Shawn-Yu Lin, German patent (8.1995) P 19533148.6 and US Patent No. 08/574-810 (December 1995)
18. H.W.P. Koops, R. Weiel, D.P. Kern, T.H. Baum, Proc. 31. Int. Symp. on Electron, Ion, and Photon Beams, J. Vac. Sci. Technol. B 6(1) 477 (1988).
19. H.W.P. Koops, J. Kretz, M. Rudolph, M. Weber, G. Dahm, K.L. Lee Jr. J. Appl. Phys Vol. 33, 7099-7107 (1994)
20. M. Weber, Dissertation Technische Hochschule Darmstadt (1995)
21. J. Kretz, M. Rudolph, M. Weber, H.W.P. Koops, Microelectronic Engineering 23, 477-481 (1994).
22. H.W.P. Koops, C. Schoessler, A. Kaya, M. Weber, Proc. EIPBN'96, submitted to J. Vac. Sci. Technol. B Nov-Dec (1996)
23. J.B. Pendry, Journal of Modern Optics Vol. 41, 2, 209 (1994)
24. H.W.P. Koops, M. Eich, W. Dultz, German patent filed 11.1995, P 19542058.6
25. H.W.P. Koops German patent filed 3. 1996, P 19610656.7
26. M. Rüb, H.W.P. Koops, T. Tschudi, Microelectronic Engineering 9, 251-254 (1989)
27. H. Eisner, H.-J. Döring, H. Schacke, G. Dahm, H.W.P. Koops, Microelectronic Engineering 23, 84-88 (1994)
28. I. Brodie, E. R. Westerberg, D. Cone, J. J. Muray, N. Williams, and L. Gasiorek, IEEE Trans. Electron Devices ED-28(11), 1422(1981)
29. N. Shimazu, K. Saito, M. Fujinami, Jap. J. Appl. Phys (1996) in print