Structure, hardness and thermal stability of TiAlN and nanolayered TiAlN/CrN multilayer films

Vacuum

Volumn 77, Issue 2, 2005, Pages 169-179

  Barshilia, Harish C ^a   Prakash, M Surya ^a   Jain, Anjana ^a   Rajam, K S ^a  

^a SURFACE ENGINEERING DIVISION   (India)

Author keywords

Nanoindentation; Reactive DC magnetron sputtering; Thermal stability; TiAlN films; TiAlN CrN multilayers; X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; HARDNESS; MAGNETRON SPUTTERING; MOLECULAR STRUCTURE; THERMODYNAMIC STABILITY; THIN FILMS; TITANIUM COMPOUNDS; X RAY ANALYSIS; X RAY DIFFRACTION;

HIGH-SPEED OPERATIONS; NANOINDENTATION; OXYGEN DIFFUSION; REACTIVE DC MAGNETRON SPUTTERING;

MULTILAYERS;

EID: 10844239699     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.08.020     Document Type: Article

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