Thin film of aluminum oxide through pulsed laser deposition: A micro-Raman study

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 79, Issue 1, 2001, Pages 49-54

  Misra, A ^a   Bist, H D ^a   Navati, M S ^a   Thareja, R K ^a   Narayan, J ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

^b NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; PULSED LASER DEPOSITION; RAMAN SPECTROSCOPY; SUBSTRATES; THIN FILMS;

MICRO-CRYSTALLINE STRUCTURES; MICRO-RAMAN SPECTROSCOPY; MICRO-STRESS;

ALUMINA;

EID: 0035090699     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(00)00554-7     Document Type: Article

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