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Volumn 200, Issue 1, 2003, Pages 155-160

Strain-engineered novel III-N electronic devices with high quality dielectric/semiconductor interfaces

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; CARRIER CONCENTRATION; DIELECTRIC MATERIALS; ELECTRON DEVICES; ELECTRONIC DENSITY OF STATES; ENERGY GAP; FIELD EFFECT TRANSISTORS; HETEROJUNCTION BIPOLAR TRANSISTORS; LEAKAGE CURRENTS; SEMICONDUCTOR MATERIALS; STRAIN RATE; TRANSCONDUCTANCE;

EID: 0348146362     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.200303339     Document Type: Article
Times cited : (15)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.