Use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 3, 1997, Pages 729-735

  Fernandez, A ^a   Nguyen, H T ^a   Britten, J A ^a   Boyd, R D ^a   Perry, M D ^a   Kania, D R ^a   Hawryluk, A M ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DIFFRACTION GRATINGS; DISPLAY DEVICES; LIGHT INTERFERENCE; OPTICAL BEAM SPLITTERS; OPTICAL TRANSFER FUNCTION; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

CRITICAL DIMENSIONS; FIELD EMISSION FLAT PANEL DISPLAYS; INTERFERENCE LITHOGRAPHY; PATTERNING ARRAYS; SUBMICRON RESIST STRUCTURES; TWO DIMENSIONAL ARRAYS;

PHOTOLITHOGRAPHY;

EID: 0031142346     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589377     Document Type: Article

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