Nanometer electron beam lithography with azide-phenolic resin resist systems

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6511-6516

  Yamamoto, Jiro ^a   Uchino, Shou Ichi ^a   Hattori, Takashi ^a   Yoshimura, Toshiyuki ^a   Murai, Fumio ^a  

^a HITACHI LTD   (Japan)

Author keywords

3, 3 dimethoxy 4, 4 diazidobiphenyl; Aromatic azide; Critical dimension control; Nanofabrication; Nanometer lithography; Negative electron beam resist; p hydroxystyrene; Phenolic resin; Resolution

Indexed keywords

EID: 0001764332     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6511     Document Type: Article

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