Effects of molecular-weight distributions of resist polymers and process control on lithography for 0.1 μm and below

Journal of Photopolymer Science and Technology

Volumn 10, Issue 4, 1997, Pages 629-634

  Yoshimura, Toshiyuki ^a   Yamamoto, Jiro ^a   Shiraishi, Hiroshi ^a   Uchino, Shou Ichi ^a   Terasawa, Tsuneo ^a   Murai, Fumio ^a   Okazaki, Shinji ^a  

^a HITACHI LTD   (Japan)

Author keywords

Acid diffusion; Critical dimension (CD) control; Molecular weight distribution; Multi step post baking; Nano edge roughness; Resolution

Indexed keywords

EID: 0000362487     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.629     Document Type: Article

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