Dissociation reactions of hydrogen in remote plasma-enhanced chemical-vapor-deposition silicon nitride

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2622-2628

  Boehme, C ^a   Lucovsky, G ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANTIREFLECTION COATINGS; DISSOCIATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAT TREATMENT; HYDROGEN BONDS; HYDROGENATION; INTERFACES (MATERIALS); ISOTOPES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAPID THERMAL ANNEALING; SILANES; SILICON NITRIDE; STOICHIOMETRY; THERMAL EFFECTS; THIN FILMS;

BOND DENSITY DYNAMICS;

HYDROGEN;

EID: 0035442524     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1398538     Document Type: Article

References (14)