메뉴 건너뛰기




Volumn 65, Issue 1, 2001, Pages 585-591

Highest-quality surface passivation of low-resistivity p-type silicon using stoichiometric PECVD silicon nitride

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CARRIER CONCENTRATION; ELECTRIC CONDUCTIVITY; NITROGEN; PASSIVATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILANES; SILICON NITRIDE; STOICHIOMETRY; THIN FILMS;

EID: 0035199111     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(00)00145-8     Document Type: Article
Times cited : (135)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.