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Volumn 65, Issue 1, 2001, Pages 585-591
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Highest-quality surface passivation of low-resistivity p-type silicon using stoichiometric PECVD silicon nitride
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Author keywords
[No Author keywords available]
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Indexed keywords
AMMONIA;
CARRIER CONCENTRATION;
ELECTRIC CONDUCTIVITY;
NITROGEN;
PASSIVATION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
REFRACTIVE INDEX;
SILANES;
SILICON NITRIDE;
STOICHIOMETRY;
THIN FILMS;
SURFACE PASSIVATION;
SURFACE RECOMBINATION VELOCITIES;
SILICON SOLAR CELLS;
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EID: 0035199111
PISSN: 09270248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0927-0248(00)00145-8 Document Type: Article |
Times cited : (135)
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References (10)
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