Large changes in refractive index by synchrotron-radiation-driven compaction of hydrogenated silicon nitride films

Applied Physics Letters

Volumn 80, Issue 17, 2002, Pages 3102-3104

  Akazawa, Housei ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE SI; DEFECT FORMATION; DIELECTRIC FUNCTIONS; EFFECTIVE MEDIUM; HIGH ENERGY PHOTONS; HYDROGENATED SILICON; INITIAL VALUES;

COMPACTION; CRYSTALLINE MATERIALS; HYDROGENATION; PLASMA DEPOSITION; REFRACTIVE INDEX; SILICON NITRIDE; SILICON OXIDES;

SILICON;

EID: 79956015882     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1475768     Document Type: Article

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