Bulk passivation of multicrystalline silicon solar cells induced by high-rate-deposited (>1 nm/s) silicon nitride films

Progress in Photovoltaics: Research and Applications

Volumn 11, Issue 2, 2003, Pages 125-130

  Hong, J ^a   Kessels, W M M ^a   Van Assche, F J H ^a   Rieffe, H C ^b   Soppe, W J ^b   Weeber, A W ^b   Van de Sanden, M C M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b TNO   (Netherlands)

Author keywords

Bulk passivation; Firing process; High rate deposition; Internal quantum efficiency; Multicrystalline silicon; Silicon nitride; Solar cells

Indexed keywords

ANTIREFLECTION COATINGS; DEPOSITION; PASSIVATION; QUANTUM EFFICIENCY; SILICON NITRIDE; THERMODYNAMIC STABILITY; THIN FILMS;

MULTICRYSTALLINE SILICON;

SOLAR CELLS;

EID: 0037343281     PISSN: 10627995     EISSN: None     Source Type: Journal    
DOI: 10.1002/pip.468     Document Type: Article

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